光刻机

一、仪器信息

仪器名称：光刻机

仪器编号：2018239711

所属实验室：薄膜制备室

存放地点：北1-111房间

生产厂商：MIDAS公司

设备型号：MDA-400M

二、技术指标

Standard Features

Sample size :  Up to 4” wafer

Mask holder size:  Up to 5”x5”

UV lamp : 350W  

UV Exposure Light source with 350Watt Power Supply

Dual CCD zoom microscope and LCD ( 17 inch ) monitor

Large Area Stationary Alignment Tooling Module with X,Y,Z and Theta motion

Wedge Error Compensation ( Air bearing type )

Dimension : 1050 (W) x 1088 (D) x 1561(H) mm

(Dimension Calculation includes vibration table)

Weight :  100 Kg

Warranty : 1 year

System specification

A. Light source module (光源模块)

   UV light source : 350nm to 450nm

   365nm Intensity : 15~20 mW/cm2

   Max. Beam Size : 4.25” x 4.25”

   Beam Uniformity : ±3%

B. Microscope

   Dual CCD zoom microscope with 17" LCD monitor

   Magnification : 80x ~ 480x ( Monitor )

C. Stage and controller module

   Exposure Timer : 0.01 sec to 999.9 sec

   Stage movement : X,Y, Z and Theta

   X, Y: 10 mm,

   Theta: ±5°

    Z Motion Travel : 10 mm

   Contact Mode : Soft, Vacuum, Hard and Proximity Vacuum & Hard contact force is adjustable

   Alignment Accuracy : <±1.0 micron

   Vac. / Pneumatic Controls : Substrate, Mask, Contact, , Chuck lock

D. Resolution

  Vacuum Contact : 1um ( Thin PR@Si Wafer )

  Hard Contact : 1um

  Soft contact : 2um

  20um Proximity : 5um

E. Utilities requirement

  Electric power : 220VAC, 50Hz, 15 Amp , single phase with Ground

  Nitrogen : >40 psi  (3 kg/cm2), 6mm tube

  Oil free Air : >85 psi  (5 kg/cm2) , 6mm tube

  Vacuum : < -200 mbar ( Vacuum Pump Include )

三、功能用途

光学光刻

主要研究方向：光刻技术研究及微结构的光刻制备

负责人：赵风周

联系方式：fzzhao@ldu.edu.cn